In early March, DNUI and Qingdao Tianren Micro-Nano Technology Co., Ltd., a leader in micro-nano manufacturing, jointly launched the Tianren Micro-Nano Technology Joint Lab. Located in Room 109a, Building A2 of the Software Park Campus, it is Northeast China’s first industry-education integration platform dedicated to nanoimprint lithography research and talent development. Adopting a "industrial-grade equipment + educational scenarios" collaborative model, the lab marks DNUI’s contribution of educational momentum to semiconductor industry transformation.  

The nanoimprint equipment donated by Qingdao Tianren utilizes revolutionary next-generation nanoimprint lithography, offering disruptive solutions for third-generation semiconductors and flexible electronics. Its three key advantages are: (1) Precision breakthrough: surpassing optical diffraction limits to achieve sub-5nm accuracy; (2) Energy efficiency: reducing process energy consumption by over 70%; (3) Productivity: increasing single-transfer efficiency by 300%.   

The joint lab strengthens practical teaching for courses like Semiconductor Manufacturing Practice, Microelectromechanical Systems, and Micro-Nano Manufacturing Technology. It deepens industry-academia-research collaboration by converting industrial equipment into teaching tools, upgrading practical training. The lab also builds a full-chain ecosystem from "teaching experiments→R&D→small-batch production," cultivating high-end talent for domestic semiconductor leaders and aiding China’s breakthrough in technological bottlenecks.